Seo, Hwan-Seok: search on Z-Library

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1

Combustion Dynamics and Stability of a Fuel-Rich Gas Generator

Seo, Seonghyeon, Kim, Seong-Ku, Choi, Hwan-Seok

Journal:

Journal of Propulsion and Power

Year:

2010

Language:

english

File:

PDF, 4.27 MB

english, 2010

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Application of actinic mask review system for the preparation of HVM EUV lithography with defect free mask

Sanchez, Martha I., Ukraintsev, Vladimir A., Na, Jihoon, Lee, Donggun, Do, Changhwan, Sim, Hong-seok, Lee, Jung-Hwan, Kim, Jungyoup, Seo, Hwan-Seok, Kim, Heebom, Jeon, Chan Uk

Year:

2017

Language:

english

File:

PDF, 1.11 MB

english, 2017

3

[American Institute of Aeronautics and Astronautics 41st AIAA/ASME/SAE/ASEE Joint Propulsion Conference & Exhibit - Tucson, Arizona ()] 41st AIAA/ASME/SAE/ASEE Joint Propulsion Conference & Exhibit - Combustion Stability Assessment of Double Swirl Coaxial Injectors Using Simulant Propellants

Lee, Kwang-Jin, Seo, Seonghyeon, Song, Joo-Young, Han, Yeoung-Min, Choi, Hwan-Seok, Seol, Woo-Seok

Year:

2005

Language:

english

File:

PDF, 539 KB

english, 2005

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Printability and inspectability of programmed pit defects on the masks in EUV lithography

La Fontaine, Bruno M., Kang, In-Yong, Seo, Hwan-Seok, Ahn, Byung-Sup, Lee, Dong-Gun, Kim, Dongwan, Huh, Sungmin, Koh, Cha-Won, Cha, Brian, Kim, Seoung-Sue, Cho, Han-Ku, Mochi, Iacopo, Goldberg, Kennet

Year:

2010

Language:

english

File:

PDF, 2.26 MB

english, 2010

5

Effects of Injector Recess and Chamber Pressure on Combustion Characteristics of Liquid–Liquid Swirl Coaxial Injectors

Ahn, Kyubok, Han, Yeoung-Min, Seo, Seonghyeon, Choi, Hwan-Seok

Journal:

Combustion Science and Technology

Year:

2010

Language:

english

File:

PDF, 997 KB

english, 2010

6

SPIE Proceedings [SPIE Photomask Japan 2015 - Yokohama, Japan (Monday 20 April 2015)] Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII - Development of high-transmittance phase-shifting mask for ArF immersion lithography

Yoshioka, Nobuyuki, Ahn, Won-suk, Seo, Hwan-Seok, Bang, Ju-Mi, Kim, Ji-Young, Song, Jae-Min, Seung, Byoung-Hoon, Kim, Hee-Bom, Jeon, Chan-Uk

Year:

2015

Language:

english

File:

PDF, 1.47 MB

english, 2015

7

Fuel-Rich Combustion Characteristics of Biswirl Coaxial Injectors

Ahn, Kyubok, Seo, Seonghyeon, Choi, Hwan-Seok

Journal:

Journal of Propulsion and Power

Year:

2011

Language:

english

File:

PDF, 1.41 MB

english, 2011

8

[American Institute of Aeronautics and Astronautics 42nd AIAA/ASME/SAE/ASEE Joint Propulsion Conference & Exhibit - Sacramento, California ()] 42nd AIAA/ASME/SAE/ASEE Joint Propulsion Conference & Exhibit - Film Cooling Effects on Wall Heat Flux of a Liquid Propellant Combustion Chamber

Kim, Jong-Gyu, Lee, Kwang-Jin, Seo, Seonghyeon, Han, Yeoung-Min, Kim, Hong-Jip, Choi, Hwan-Seok

Year:

2006

Language:

english

File:

PDF, 475 KB

english, 2006

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Printability and inspectability of defects on EUV blank for 2xnm hp HVM application

Huh, Sungmin, Kang, In-Yong, Jeong, Chang Young, Na, Jihoon, Lee, Dong Ryul, Seo, Hwan-seok, Kim, Seong-Sue, Jeon, Chan-Uk, Doh, Jonggul, Inderhees, Gregg, Ahn, Jinho, Naulleau, Patrick P., Wood II, O

Year:

2012

Language:

english

File:

PDF, 870 KB

english, 2012

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Durability of Ru-based EUV masks and the improvement

Wood, Obert R., Panning, Eric M., Lee, Suyoung, Kim, Jungyoup, Koh, Soo-Wan, Jang, Ilyong, Choi, Jaehyuck, Ko, Hyungho, Seo, Hwan-Seok, Kim, Seong-Sue, Kim, Byung Gook, Jeon, Chan-Uk

Year:

2014

Language:

english

File:

PDF, 6.60 MB

english, 2014

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication

Seo, Hwan-Seok, Schellenberg, Frank M., La Fontaine, Bruno M., Lee, Dong-Gun, Ahn, Byung-Sup, Han, Hakseung, Huh, Sungmin, Kang, In-Yong, Kim, Hoon, Kim, Dongwan, Kim, Seong-Sue, Cho, Han-Ku

Year:

2009

Language:

english

File:

PDF, 4.83 MB

english, 2009

12

Effect of Simultaneous Mechanical and Electrical Stress on the Electrical Performance of Flexible In-Ga-Zn-O Thin-Film Transistors

Seo, Youngjin, Jeong, Hwan-Seok, Jeong, Ha-Yun, Park, Shinyoung, Jang, Jun Tae, Choi, Sungju, Kim, Dong Myong, Choi, Sung-Jin, Jin, Xiaoshi, Kwon, Hyuck-In, Kim, Dae Hwan

Journal:

Year:

2019

Language:

english

File:

PDF, 1.70 MB

english, 2019

13

Emergent CT findings of impending cardiac arrest: a report of 4 cases

Hong, Sun Hwa, Kang, Eun-Young, Huh, Sik, Yong, Hwan-Seok, Kim, Yoon Kyung, Woo, Ok Hee, Seo, Tae-Seok

Journal:

The American Journal of Emergency Medicine

Year:

2013

Language:

english

File:

PDF, 858 KB

english, 2013

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Printability and inspectability of defects on the EUV mask for sub-32nm half pitch HVM application

Huh, Sungmin, La Fontaine, Bruno M., Naulleau, Patrick P., Kang, In-Yong, Kim, Sang-Hyun, Seo, Hwan-seok, Kim, Dongwan, Park, Jooon, Kim, Seong-Sue, Cho, Han-Ku, Goldberg, Kenneth, Mochi, Iacopo, Shok

Year:

2011

Language:

english

File:

PDF, 3.38 MB

english, 2011

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Experimental verification of EUV mask limitations at high numerical apertures

Chao, Rikon, Graeupner, Paul, Gullikson, Eric, Kim, Seong-Sue, Neumann, Jens-Timo, Miyakawa, Ryan, Seo, Hwan-Seok, Neureuther, Andy, Naulleau, Patrick, Naulleau, Patrick P.

Year:

2013

Language:

english

File:

PDF, 373 KB

english, 2013

16

Optical properties of TaTe2O7 thin films as absorber materials for extreme ultraviolet lithography binary masks

Young Kang, Hee, Peranantham, Pazhanisami, Kwon Hwangbo, Chang, Seo, Hwan-Seok, Kim, Seong-Su, Hoon Lee, Jang

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

2012

Language:

english

File:

PDF, 1013 KB

english, 2012

17

Effect of Simultaneous Mechanical and Electrical Stress on the Electrical Performance of Flexible In-Ga-Zn-O Thin-Film Transistors

Seo, Youngjin, Jeong, Hwan-Seok, Jeong, Ha-Yun, Park, Shinyoung, Jang, Jun Tae, Choi, Sungju, Kim, Dong Myong, Choi, Sung-Jin, Jin, Xiaoshi, Kwon, Hyuck-In, Kim, Dae Hwan

Journal:

Year:

2019

File:

PDF, 1.70 MB

2019

18

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Analysis of process margin in EUV mask repair with nano-machining

Lee, Su-Young, Kawahira, Hiroichi, Zurbrick, Larry S., Kim, Geun-Bae, Sim, Hong-Seok, Lee, Sang-Hyeon, Kim, Hwa-Sung, Lee, Jung-Hwan, Seo, Hwan-Seok, Han, Hak-Seung, Kim, Seong-Sue, Moon, Seong-Yong,

Year:

2008

Language:

english

File:

PDF, 1.24 MB

english, 2008

19

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Properties of EUVL masks as a function of capping layer and absorber stack structures

Seo, Hwan-Seok, Lercel, Michael J., Park, Jinhong, Lee, Seung-Yoon, Park, Joo-On, Kim, Hun, Kim, Seong-Sue, Cho, Han-Ku

Year:

2007

Language:

english

File:

PDF, 895 KB

english, 2007

20

Combustion Characteristics of Bi-Liquid Swirl Coaxial Injectors with Respect to a Recess

SEO, Seonghyeon, HAN, Yeoung-Min, CHOI, Hwan-Seok

Journal:

Transactions of the Japan society for Aeronautical and space sciences

Year:

2010

Language:

english

File:

PDF, 401 KB

english, 2010

21

Combustion characteristics of swirl coaxial injectors at kerosene-rich conditions

Lim, Byung-Jik, Seo, Seonghyeon, Kim, Munki, Ahn, Kyubok, Kim, Jong-Gyu, Choi, Hwan-Seok

Journal:

Year:

2013

Language:

english

File:

PDF, 503 KB

english, 2013

22

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Huh, Sungmin, Kim, Hoon, Yoon, Gisung, Choi, Jaehyuck, Lee, Han-Shin, Lee, Dong Gun, Ahn, Byungsup, Seo, Hwan-Seok, Kim, Dongwan, Kim, Seoung Sue, Cho, Han Ku, Watanabe, Takeo, Kinoshita, Hiroo, Schel

Year:

2008

Language:

english

File:

PDF, 523 KB

english, 2008

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Effects of multilayer period on EUVL imaging for 2X node and beyond

Lee, Su-Young, Seo, Hwan-Seok, Kim, Tae-Geun, Kim, Sang-Hyun, Chalykh, Roman, Kim, Seong-Sue, Jeon, Chan-Uk, Naulleau, Patrick P.

Year:

2013

Language:

english

File:

PDF, 3.06 MB

english, 2013

24

[IEEE 2007 IEEE Custom Integrated Circuits Conference - San Jose, CA, USA (2007.09.16-2007.09.19)] 2007 IEEE Custom Integrated Circuits Conference - An All-Digital 90-Degree Phase-Shift DLL with Loop-Embedded DCC for 1.6Gbps DDR Interface

Bae, Jun-Hyun, Seo, Jin-Ho, Yeo, Hwan-Seok, Kim, Jae-Whui, Sim, Jae-Yoon, Park, Hong-June

Year:

2007

Language:

english

File:

PDF, 4.10 MB

english, 2007

25

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Printability study of pattern defects in the EUV mask as a function of hp nodes

Kim, Tae-Geun, Seo, Hwan-Seok, Kang, In-Yong, Jeong, Chang Young, Huh, Sungmin, Na, Jihoon, Kim, Seong-Sue, Jeon, Chan-Uk, Mochi, Iacopo, Goldberg, Kenneth A., Naulleau, Patrick P., Wood II, Obert R.

Year:

2012

Language:

english

File:

PDF, 1.20 MB

english, 2012

26

Optical Performance of Extreme Ultraviolet Lithography Mask with an Indium Tin Oxide Absorber

Kang, Hee Young, Park, Sungjin, Hwangbo, Chang Kwon, Seo, Hwan-Seok, Kim, Seong-Su, Cho, Han-Ku

Journal:

Journal of Nanoscience and Nanotechnology

Year:

2012

Language:

english

File:

PDF, 597 KB

english, 2012

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues

La Fontaine, Bruno M., Seo, Hwan-Seok, Lee, Dong-Gun, Ahn, Byung-Sup, Koh, Cha-Won, Kang, In-Yong, Kim, Tae Geun, Kim, Hoon, Kim, Dongwan, Kim, Seong-Sue, Cho, Han-Ku

Year:

2010

Language:

english

File:

PDF, 1.57 MB

english, 2010

28

[American Institute of Aeronautics and Astronautics 42nd AIAA/ASME/SAE/ASEE Joint Propulsion Conference & Exhibit - Sacramento, California ()] 42nd AIAA/ASME/SAE/ASEE Joint Propulsion Conference & Exhibit - Parametric Study on Combustion Characteristics of Bi-Liquid Swirl Coaxial Injectors

Moon, Il-Yoon, Seo, Seonghyeon, Han, Yeoung-Min, Lim, Byoungjik, Choi, Hwan-Seok

Year:

2006

Language:

english

File:

PDF, 540 KB

english, 2006

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